It is made of high-purity silicone, which is manufactured by various processes such as chemical synthesis, surface treatment, and ultra-fine grade. Suitable for high-speed CCL.
High purity and low dielectric loss.
High spheroidization rate and high fluidity, Lower CTE.
Recommended application: HDI boards, high-frequency high-speed CCL, IC substrates, FCCL, LCP materials and ABF films.
It is made of high-purity silicone, which is manufactured by various processes such as chemical synthesis, surface treatment, and ultra-fine grade. Suitable for high-speed CCL.
High purity and low dielectric loss.
High spheroidization rate and high fluidity, Lower CTE.
Recommended application: HDI boards, high-frequency high-speed CCL, IC substrates, FCCL, LCP materials and ABF films.
Typical data
|
Test Items |
Unit |
CC-10 |
CC-30 |
CC-40 |
Test Method |
|
|
Particle Size |
D50 |
μm |
0.78 |
1.56 |
3.7 |
Laser particle size analyzer |
|
D99 |
μm |
1.20 |
3.80 |
6.2 |
||
|
Chemical Composition (SiO2) |
% |
99.9 |
XRF |
|||
|
Spheroidization Rate |
% |
100.0 |
SEM |
|||
|
pH |
—— |
6.5 |
6.0 |
5.5 |
Acid base detector |
|
|
SSA |
m2/g |
7.5 |
5.4 |
3.5 |
SSA analyzer |
|
|
tanδ |
—— |
0.0006 (10GHz) |
0.00045 (10GHz) |
0.00036 (10GHz) |
Paraffin Compression Method |
|
|
CTE |
ppm/℃ |
0.50 |
Theoretical Value |
|||
Typical data
|
Test Items |
Unit |
CC-10 |
CC-30 |
CC-40 |
Test Method |
|
|
Particle Size |
D50 |
μm |
0.78 |
1.56 |
3.7 |
Laser particle size analyzer |
|
D99 |
μm |
1.20 |
3.80 |
6.2 |
||
|
Chemical Composition (SiO2) |
% |
99.9 |
XRF |
|||
|
Spheroidization Rate |
% |
100.0 |
SEM |
|||
|
pH |
—— |
6.5 |
6.0 |
5.5 |
Acid base detector |
|
|
SSA |
m2/g |
7.5 |
5.4 |
3.5 |
SSA analyzer |
|
|
tanδ |
—— |
0.0006 (10GHz) |
0.00045 (10GHz) |
0.00036 (10GHz) |
Paraffin Compression Method |
|
|
CTE |
ppm/℃ |
0.50 |
Theoretical Value |
|||